APOC 2002: Asia-Pacific Optical and Wireless Communications : optical networking II : 16-18 October 2002, Shanghai, China. pp.266-274, 2002. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Shin, J. ; Choi, J. ; Park, S. ; Lee, J. ; Yoo, M. ; Kong, J.
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Photomask and Next-Generation Lithography Mask Technology XIII. pp.628339-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Shin, J. ; Choi, J. ; Jung, D. ; Lee, J. ; Yoo, M. ; Kong, J.
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Photomask and Next-Generation Lithography Mask Technology XII. pp.124-130, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering