1.

Conference Proceedings
Conference Proceedings
1. Resolution improvement of EPL stencil mask using thin membrane [6151-52]
Sugimura, H. ; Eguchi, H. ; Norimoto, M. ; Negishi, Y. ; Yonekura, I. ; Ito, K. ; Tamura, A. ; Koba, F. ; Arimoto, H
Pub. info.: Emerging Lithographic Technologies X.  pp.61511F-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
2.

Conference Proceedings
Conference Proceedings
2. Defect inspection strategy of LEEPL masks [5853-82]
Yonekura, I. ; Kunitani, S. ; Susa, T. ; Itoh, K. ; Tamura, A. ; Maruyama, S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.933-943,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853