1.

Conference Proceedings
Conference Proceedings
1. High transmission mask technology for 45nm node imaging
Irisawa, J. ; Okazoe, T. ; Eriguchi, T. ; Yokokoji, O.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.349-354,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Fluoropolymers for 157-nm single-layer resists developed using a new etching rate estimation model (KI-Model)
Kawaguchi, Y. ; Sasaki, T. ; Irisawa, J. ; Yokokoji, O. ; Irie, S. ; Otoguro, A. ; Itani, T. ; Fujii, K.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.525-532,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
3.

Conference Proceedings
Conference Proceedings
3. A new monocyclic fluropolymer structure for 157-nm photoresists
Takebe, Y. ; Eda, M. ; Okada, S. ; Yokokoji, O. ; Irie, S. ; Otoguro, A. ; Fujii, K. ; Itani, T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.151-158,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
4.

Conference Proceedings
Conference Proceedings
4. 157-nm single-layer resist based on novel monocyclic fluorinated polymer
Otoguro, A. ; Irie, S. ; Itani, T. ; Fujii, K. ; Takebe, Y. ; Kawaguchi, Y. ; Yokokoji, O.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.186-195,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
5.

Conference Proceedings
Conference Proceedings
5. Dry-etching resistance of fluoropolymers for 157-nm single-layer resists
Kawaguchi, Y. ; Irisawa, J. ; Kodama, S. ; Okada, S. ; Takebe, Y. ; Kaneko, I. ; Yokokoji, O. ; Ishikawa, S. ; Irie, S. ; Hagiwara, T. ; Itani, T.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.43-52,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
6.

Conference Proceedings
Conference Proceedings
6. Performances of resists for 157-nm lithography based on monocyclic fluoropolymers
Ishikawa, S. ; Irie, S. ; Itani, T. ; Kawaguchi, Y. ; Yokokoji, O. ; Kodama, S.-.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.580-588,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039