1.

Conference Proceedings

Conference Proceedings
Goethals,A.M. ; Vertommen,J. ; Roey,F.Van ; Yen,A. ; Tritchkov,A. ; Ronse,K. ; Jonckheere,R. ; hove,L.Van den
Pub. info.: Optical Microlithography IX.  Part1  pp.362-374,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
2.

Conference Proceedings

Conference Proceedings
Ronse,K. ; Beeck,M.Opde ; Yen,A. ; Kim,K.-H. ; hove,L.Van den
Pub. info.: Optical Microlithography IX.  Part2  pp.555-563,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
3.

Conference Proceedings

Conference Proceedings
Beeck,M.Op de ; Bruggeman,B. ; Botermans,H. ; Driessche,V.Van ; Yen,A. ; Tritchkov,A. ; Jonckheere,R. ; Ronse,K. ; hove,L.Van den
Pub. info.: Optical Microlithography IX.  Part2  pp.622-633,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
4.

Conference Proceedings

Conference Proceedings
Chen,Y.T. ; Lin,C.H. ; Lin,H.T. ; Hsieh,H.C. ; Yu,S.S. ; Yen,A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.99-110,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
5.

Conference Proceedings

Conference Proceedings
Lin,H.T. ; Lin,J.C.H. ; Chiu,C.S.G. ; Wang,Y.Y. ; Yen,A.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.307-315,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
6.

Conference Proceedings

Conference Proceedings
Tritchkov,A. ; Rieger,M.L. ; Stirniman,J.P. ; Yen,A. ; Ronse,K. ; Vandenberghe,G. ; hove,L.Van den
Pub. info.: Optical Microlithography X.  pp.726-738,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
7.

Conference Proceedings

Conference Proceedings
Kuo,H.J. ; Lin,C.H. ; Tzu,S.D. ; Yen,A.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.435-445,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
8.

Conference Proceedings

Conference Proceedings
Wang,C.-M. ; Yu,S.-S. ; Yen,A.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.783-791,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
9.

Conference Proceedings

Conference Proceedings
Wang,Y.-Y. ; Lin,H.-T. ; Yu,S.-S. ; Chen,C.-K. ; Ku,Y.-C. ; Yen,A. ; Lin,B.J.
Pub. info.: Optical Microlithography XIV.  4346  pp.276-292,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
10.

Conference Proceedings

Conference Proceedings
Wang,C.-M.A. ; Lin,S.-J. ; Lin,C.-H. ; Ku,Y.-C. ; Yen,A.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  4186  pp.275-286,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186