1.

Conference Proceedings
Conference Proceedings
1. Generating sub-30-nm polysilicon gates using PECVD amorphous carbon as hardmask and anti-reflective coating
Liu, W. ; Mui, D. ; Lill, T. ; Wang, M.D. ; Bencher, C. ; Kwan, M. ; Yeh, W. ; Ebihara, T. ; Oga, T.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.841-848,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Beyond k1=0.25 lithography: 70-nm L/S patterning using KrF scanners
Ebihara, T. ; Levenson, M.D. ; Liu, W. ; He, J. ; Yeh, W. ; Ahn, S. ; Oga, T. ; Shen, M. ; M'saad, H.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.985-994,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256