1.

Conference Proceedings
Conference Proceedings
1. Optimization of high-power broad-area semiconductor lasers
Yang,S.-H. ; He,X. ; Kanskar,M. ; Wilson,S. ; Ovtchinnikov,A. ; Macomber,S.H. ; Gupta,S.
Pub. info.: Physics and simulation of optoelectronic devices VIII : 24-28 January 2000, San Jose, USA.  Part1  pp.366-375,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3944
2.

Conference Proceedings
Conference Proceedings
2. Effect of beam blur in mask fabrication
Yang,S.-H. ; Ki,W.-T. ; Moon,S.-Y. ; Jeong,T.-M. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.468-473,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
3.

Conference Proceedings
Conference Proceedings
3. Mask considerations for manufacturing assist features
Choi,J.-H. ; Cho,W.-I. ; Kim,B.-S. ; Yang,S.-H. ; Moon,S.-Y. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.
Pub. info.: Optical Microlithography XIV.  4346  pp.131-140,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
4.

Conference Proceedings
Conference Proceedings
4. Dose latitude dependency on resist contrast in e-beam mask lithography
Cha,B.-C. ; Moon,S.-Y. ; Ki,W.-T. ; Yang,S.-H. ; Choi,S.-W. ; Han,W.-S. ; Yoon,H.-S. ; Sohn,J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.200-209,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
5.

Conference Proceedings
Conference Proceedings
5. Analysis of photomask distortion caused by blank materials and open ratios
Moon,S.-Y. ; Ki,W.-T. ; Yang,S.-H. ; Jeong,T.-M. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.227-232,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
6.

Conference Proceedings
Conference Proceedings
6. Application of chemically amplified resist to 10-keV e-beam system
Ahn,S. ; Kim,C. ; Yang,S.-H. ; Moon,S.-Y. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.324-330,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
7.

Conference Proceedings
Conference Proceedings
7. Prediction of MEEF using a simple model and MEEF enhancement parameters
Chung,D.-H. ; Yang,S.-H. ; Kim,H.-D. ; Shin,I.-G. ; Kim,Y.-H. ; Choi,S.-W. ; Han,W.-S. ; Sohn,J.-M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.94-100,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409