Ma, Z.M. ; Kim, W.D. ; Rathsack, B.M. ; Xing, G. ; Somervell, M.H. ; Hong, H.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology IX. pp.677-683, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering