1.

Conference Proceedings
Conference Proceedings
1. Effect of local interconnect etch-stop layer on channel hot-electron degradation
Cheek,J. ; Nariman,H.E. ; Wristers,D. ; Nayak,D. ; Hao,M.-Y.
Pub. info.: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.268-274,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3212
2.

Conference Proceedings
Conference Proceedings
2. Boron segregation in As-implanted Si due to electric field and transient enhanced diffusion
Chang,R.D. ; Choi,P.S. ; Wristers,D. ; Chu,P.K. ; Kwong,D.L.
Pub. info.: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.296-303,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3212
3.

Conference Proceedings
Conference Proceedings
3. Device performance and optimization for 5th-and 6th-generation microprocessors
Bandyopadhyay,B. ; Cheek,J. ; Dawson,R. ; Duane,M. ; Fulford,J. ; Gardner,M. ; Hause,F. ; Ho,B. ; Kadosh,D. ; Lee,R. ; Hao,M.-Y. ; May,C. ; Michael,M. ; Moore,B. ; Nayak,D. ; Nistler,J. ; Wristers,D.
Pub. info.: Microelectronic Device Technology : 1-2 October 1997, Austin, Texas.  pp.33-39,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3212
4.

Conference Proceedings
Conference Proceedings
4. High-performance vs. low-power technology roadmaps: how are they different?
Wristers,D.
Pub. info.: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.134-139,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4181
5.

Conference Proceedings
Conference Proceedings
5. Materials and processing issues in the development of N2O/NO-based ultrathin oxynitride gate dielectrics for CMOS ULSI applications
Kim,B.Y. ; Wristers,D. ; Kwong,D.L.
Pub. info.: Microelectronic Device and Multilevel Interconnection Technology II.  pp.188-200,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2875
6.

Conference Proceedings
Conference Proceedings
6. Material processing and advanced well structures using high-energy implantation for EPI replacement
Wristers,D. ; Eiting,C. ; Morris,W. ; Kwong,D.-L. ; Fulford,J.
Pub. info.: Microelectronic Manufacturing Yield, Reliability, and Failure Analysis.  pp.234-245,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2635
7.

Conference Proceedings
Conference Proceedings
7. Improved p-ch MOS transistor performance with an arsenic supersteep retrograde channel profile
Buller,J.F. ; Cheek,J. ; Wristers,D. ; Kadosh,D. ; Duane,M.
Pub. info.: Microelectronic Device Technology III.  pp.138-144,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3881