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15 results

Conference Proceedings

1. Stability of CrFx films for phase-shifting mask

Kim,E. ; Hong,S. ; Jiang,Z.-T. ; Lim,S. ; Woo,S.-G. ; Koh,Y.-B. ; No,K.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.294-297, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

2. Design and synthesis of new photoresist materials for ArF lithography

Choi,S.-J. ; Kim,H.-W. ; Woo,S.-G. ; Moon,J.-T.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.54-61, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

3. Novel polymers for 193-nm single-layer resist based on cycloolefin polymers

Kim,H.-W. ; Lee,S.-H. ; Kwon,K.-Y. ; Jung,D.-W. ; Lee,S. ; Yoon,K.-S. ; Choi,S.-J. ; Woo,S.-G. ; Moon,J.-T.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part2 pp.1100-1107, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

4. Novel resst material for sub-100-nm contact hole pattern

Chung,J.-H. ; Choi,S.-J. ; Kang,Y. ; Woo,S.-G. ; Moon,J.-T.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.305-312, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

5. Investigation on application of chromium-based materials to attenuated phase-shift masks for DUV exposure

Hong,S. ; Kim,E. ; Jiang,Z.-T. ; Bae,B.-S. ; No,K. ; Shin,W. ; Lim,S.-C. ; Woo,S.-G. ; Koh,Y.-B.

Pub. info.:	Photomask and X-Ray Mask Technology III. pp.134-137, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2793

Conference Proceedings

6. Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes

Lim,S.-C. ; Kye,J.-W. ; Woo,S.-G. ; Kim,S.-G. ; Kang,H.-Y. ; Han,W.-S. ; Koh,Y.-B.

Pub. info.:	Optical Microlithography IX. Part2 pp.516-523, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726

Conference Proceedings

7. Application of alternating phase-shifting masks to 200-nm contact holes

Lim,S.-C. ; Woo,S.-G. ; Park,C.-G. ; Koh,Y.-B.

Pub. info.:	16th Annual BACUS Symposium on Photomask Technology and Management. pp.243-254, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2884

Conference Proceedings

8. Novel 193-nm photoresist based on Olefin-containing lactones

Yoon,K.-S. ; Jung,D.-W. ; Lee,S. ; Lee,S.-H. ; Choi,S.-J. ; Woo,S.-G. ; Moon,J.-T.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.688-694, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

9. Design and performance of photoresist materials for ArF lithography

Kim,H.-W. ; Jung,D.-W. ; Lee,S. ; Choi,S.-J. ; Woo,S.-G. ; Kavanagh,R.J. ; Barclay,G.G. ; Blacksmith,R.F. ; Kang,D. ; Pohlers,G. ; Cameron,J.F. ; Mattia,J. ; Caporale,S. ; Penniman,T. ; Joesten,L.A. ; Thackeray,J.W.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.776-783, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

10.

Conference Proceedings

10. Development of resists for thermal flow process applicable to mass production

Kang,Y. ; Woo,S.-G. ; Choi,S.-J. ; Moon,J.-T.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.222-231, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

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Author: Woo,S.-G.