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34 results

Conference Proceedings

1. Toward DFM: process worthy design and OPC through verification method using MEEF, TF・MEEF, and MTT [6156-21]

Kim, I.-S. ; Suh, S. ; Jung, S. ; Lee, E. ; Kang, Y.-S. ; Lee, S. ; Woo, S.-G. ; Cho, H.

Pub. info.:	Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA. pp.61560L-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6156

Conference Proceedings

2. Novel surface silylation process for chemically amplified photoresist

Lee, S.-H. ; Hong, J. ; Woo, S.-G. ; Cho, H.-G. ; Han, W,-S.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part Two pp.1005-1012, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

3. First microprocessors with immersion lithography

Lee, D.-Y. ; Kim, I.-S. ; Jung, S.-G. ; Jung, M.-H. ; Park, J.-O. ; Oh, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.119-128, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

4. Layer-specific illumination for low-k1 periodic and semiperiodic DRAM cell patterns: design procedure and application

Hwang, C. ; Nam, D.-S. ; Park, J.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVII. pp.947-952, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

Conference Proceedings

5. Investigation of stray light characteristic by multiple Gaussian modeling and its OPC application

Kim, H. ; Nam, D. ; Yeo, G.-S. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVII. pp.459-462, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

Conference Proceedings

6. Impact of illumination intensity profile on lithography simulation

Hwang, C. ; Kim, I. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVII. pp.1427-1434, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

Conference Proceedings

7. Modified procedure for evaluation of low-k1 process windows

Park, D.-W. ; Lee, S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVII. pp.1422-1426, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

Conference Proceedings

8. A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns

Lee, S. ; Hwang, C. ; Park, D.-W. ; Kim, I.-S. ; Kim, H.-C. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.

Pub. info.:	Optical Microlithography XVII. pp.1413-1421, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

Conference Proceedings

9. Strategy for sub-80-nm contact hole patterning considering device fabrication

Yoon, J.-Y. ; Hata, M. ; Hah, J.-H. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Advances in resist technology and processing XXI. pp.196-204, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

10.

Conference Proceedings

10. Comprehensive analysis of sources of total CD variation in ArF resist perspective

Kim, H.-W. ; Lee, H.-R. ; Kim, K.-M. ; Lee, S.Y. ; Kim, B.-C. ; Oh, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Advances in resist technology and processing XXI. pp.254-265, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5376

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Author: Woo, S.-G.