1.

Conference Proceedings
Conference Proceedings
1. Reduced Poly-Si Gate Depletion Effect by Pulsed Excimer Laser Annealing
Wong, H.Y. ; Takeuchi, H. ; King, T.-J. ; Ameen, M. ; Agarwal, A.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.205-215,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01
2.

Conference Proceedings
Conference Proceedings
2. 22 Pulsed Excimer Laser Annealing for Meeting Near-Term Gate-Stack Process Challenges
Wong, H.Y. ; Takeshi, H. ; Padilla, A. ; King, T.-J. ; Ameen, M. ; Agarwal, A.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.179-187,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05