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Develop process optimization for CD uniformity improvement

Author(s):
Shin,J.-C.
Won,J.-I.
Jung,H.-Y.
Kim,M.-S.
Choi,Y.-K.
Han,O.
1 more
Publication title:
20th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
Pub. Year:
2000
Page(from):
540
Page(to):
548
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819438492 [0819438499]
Language:
English
Call no.:
P63600/4186
Type:
Conference Proceedings

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