1.

Conference Proceedings
Conference Proceedings
1. Process, design, and optical proximity correction requirements for the 65-nm device generation
Lucas, K. ; Montgomery, P. ; Litt, L.C. ; Conley, W. ; Postnikov, S.V. ; Wu, W. ; Yuan, C.-M. ; Olivares, M. ; Strozewski, K. ; Carter, R.L. ; Vasek, J. ; Smith, D. ; Fanucchi, E.L. ; Wiaux, V. ; Vandenberghe, G. ; Toublan, O. ; Verhappen, A. ; Kuijten, J.P. ; van Wingerden, J. ; Kasprowicz, B.S. ; Tracy, J.W. ; Progler, C.J. ; Shiro, E. ; Topouzov, I. ; Wimmer, K. ; Roman, B.J.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.353-364,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
2.

Conference Proceedings
Conference Proceedings
2. Investigation of model-based physical design restrictions(Invited Paper)
Lucas, K. ; Baron, S. ; Belledent, J. ; Boone, R. ; Borjon, A. ; Couderc, C. ; Patterson, K. ; Riviere-Cazaux, L. ; Rody, Y. ; Sundermann, F. ; Toublan, O. ; Trouiller, Y. ; Urbani, J. -C. ; Wimmer, K.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.85-96,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
3.

Conference Proceedings
Conference Proceedings
3. Combining OPC and design for printability into 65-nm logic designs
Lucas, K.D. ; Yuan, C.-M. ; Boone, R. ; Strozewski, K. ; Porter, J. ; Tian, R. ; Wimmer, K. ; Cobb, J. ; Wilkinson, B. ; Toublan, O.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.158-169,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
4.

Conference Proceedings
Conference Proceedings
4. Investigation of product design weaknesses using model-based OPC sensitivity analysis
Postnikov, S.V. ; Lucas, K. ; Garza, C.M. ; Wimmer, K. ; LaCour, P. ; Word, J.C.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.160-171,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
5.

Conference Proceedings
Conference Proceedings
5. Process, design and optical proximity correction requirements for the 65nm device generation
Lucas, K. ; Montgomery, P. ; Litt, L.C. ; Conley, W. ; Postnikov, S.V. ; Wu, W. ; Yuan, C.-M. ; Olivares, M. ; Strozewski, K. ; Carter, R.L. ; Vasek, J. ; Smith, D. ; Fanucchi, E.L. ; Wiaux, V. ; Vandenberghe, G. ; Toublan, O. ; Verhappen, A. ; Kuijten, J.P. ; Wingerden, J. ; Kasprowicz, B.S. ; Tracy, J.W. ; Progler, C.J. ; Shiro, E. ; Topouzov, I. ; Wimmer, K. ; Roman, B.J.
Pub. info.: Optical Microlithography XVI.  Part One  pp.408-419,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
6.

Conference Proceedings
Conference Proceedings
6. Monte Carlo method for highly efficient and accurate statistical lithography simulations
Postnikov, S.V. ; Lucas, K. ; Wimmer, K. ; Ivin, V. ; Rogov, A.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1118-1126,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
7.

Conference Proceedings
Conference Proceedings
7. Model-based design improvements for the 100-nm lithography generation
Lucas, K. ; Postnikov, S.V. ; Patterson, K. ; Yuan, C.-M. ; Thomas, C. ; Thompson, M.A. ; Carter, R. ; Litt, L.C. ; Montgomery, P.K. ; Wimmer, K.
Pub. info.: Optical Microlithography XV.  Part One  pp.215-226,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691