Characterization and etching of sputter-deposited absorber films for extreme ultraviolet lithography (EUVL) masks

Characterization and etching of sputter-deposited absorber films for extreme ultraviolet lithography (EUVL) masks

Author(s):

Racette,K.C. ( Photronics, Inc. )
Williams,C.T.
Lercel,M.J.

Publication title:

21st Annual BACUS Symposium on Photomask Technology

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4562

Pub. Year:

2001

Vol.:

4562

Pt.:

Two of Two Parts

Page(from):

883

Page(to):

892

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819442901 [0819442909]

Language:

English

Call no.:

P63600/4562

Type:

Conference Proceedings

Details

TDL ID:	ZA00012276
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2001 : 21st
Conf. info. (Venue):	Monterey, CA, USA
Conf. info. (Date):	2001.10.03-2001.10.05

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