PZT stack etch for MEMS devices in a capacitively coupled high-density plasma reactor
- Author(s):
- Werbaneth, P.F. ( Tegal Corp. (USA) )
- Almerico, J.
- Jerde, L.G.
- Marks, S.
- Publication title:
- Device and process technologies for MEMS and Microelectronics II : 17-19 December 2001, Adelaide, Australia
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4592
- Pub. Year:
- 2001
- Page(from):
- 267
- Page(to):
- 273
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819443229 [0819443220]
- Language:
- English
- Call no.:
- P63600/4592
- Type:
- Conference Proceedings
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