1.

Conference Proceedings
Conference Proceedings
1. Investigation of Pre-Tungsten Silicide Deposition Wet Chemical Processing
Philipossian, A. ; Moinpour, M. ; Wilkinson, R. ; Watt, V. H. C.
Pub. info.: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.75-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 386
2.

Conference Proceedings
Conference Proceedings
2. Process and Manufacturing Challenges for High-K Gate Stack Systems
Gilmer, M. C. ; Luo, T-Y. ; Huff, H. R. ; Jackson, M. D. ; Kim, S. ; Bersuker, G. ; Zeitzoff, P. ; Vishnubhotla, L. ; Brown, G. A. ; Amos, R. ; Brady, D. ; Watt, V. H. C. ; Gale, G. ; Guan, J. ; Nguyen, B. ; Williamson, G. ; Lysaght, P. ; Torres, K. ; Geyling, F. ; Gondran, C. F. H.
Pub. info.: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.323-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 567
3.

Conference Proceedings
Conference Proceedings
3. Electrical and physical characterization of ultrathin silicon oxynitride gate dielectric films formed by the jet vapor deposition technique
Karamcheti, A. ; Watt, V. H. C. ; Luo, T. Y. ; Brady, D. ; Shaapur, F. ; Vishnubhotla, L. ; Gale, G. ; Huff, H. R. ; Jackson, M. D. ; Torres, K. ; Diebold, A. ; Guan, J. ; Gilmer, M. C. ; Brown, G. A. ; Bersuker, G. ; Zeitzoff, P. ; Tamagawa, T. ; Guo, X. ; Wang, X. W. ; Ma, T. P.
Pub. info.: Structure and electronic properties of ultrathin dielectric films on silicon and related structures : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A..  pp.307-,  2000.  Warrendale, PA.  MRS-Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 592
4.

Conference Proceedings
Conference Proceedings
4. SURFACE ROUGHNESS INVESTIGATION OF THIN SiO2 FILMS DEPOSITED FROM N2O AND SiH4
Watt, V. H. C. ; Moinpour, M. ; Sadjadi, R. ; Lu, W. ; Neubauer, G. ; Bower, R.
Pub. info.: Evolution of thin film and surface structure and morphology : symposium held November 28-December 2, 1994, Boston, Massachusetts, USA.  pp.377-,  1995.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 355