1.

Conference Proceedings
Conference Proceedings
1. Application of alternating phase-shifting masks to 140-nm gate patterning: II. Mask design and manufacturing tolerances
Liu,H.-Y. ; Karklin,L. ; Wang,Y.-T. ; Pati,Y.C.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.2-14,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Practicing extension of 248-nm DUV optical lithography using trim-mask PSM
Kling,M.E. ; Cave,N. ; Falch,B.J. ; Fu,C.-C. ; Green,K.G. ; Lucas,K.D. ; Roman,B.J. ; Reich,A.J. ; Sturtevant,J.L. ; Tian,R. ; Russell,D.R. ; Karklin,L. ; Wang,Y.-T.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.10-17,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Multicast routing for wavelength-routed WDM networks with dynamic membership
Huang,N.-F. ; Liu,T.-L. ; Wang,Y.-T. ; Li,B.
Pub. info.: OptiComm 2000: Optical Networking and Communications.  pp.179-190,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4233
4.

Conference Proceedings
Conference Proceedings
4. First-order rate-based flow control with dynamic queue threshold for high-speed wide-area ATM networks
Chong,S. ; Nagarajan,R. ; Wang,Y.-T.
Pub. info.: Performance and Control of Network Systems.  pp.259-270,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3231
5.

Conference Proceedings
Conference Proceedings
5. Application of alternating phase-shifting masks to 140-nm gate patterning: Iinewidth control improvements and design optimization
Liu,H.-Y. ; Karklin,L. ; Wang,Y.-T. ; Pati,Y.C.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.328-337,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236