1.

Conference Proceedings
Conference Proceedings
1. Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50]
Hsu, M. ; Van Den Broeke, D. ; Laidig, T. ; Wampler, K. E. ; Hollerbach, U. ; Socha, R. ; Chen, J. F. ; Hsu, S. ; Shi, X.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.659-671,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
2.

Conference Proceedings
Conference Proceedings
2. Resolution enhancement with high-transmission attenuating phase-shift masks
Socha, R. J. ; Conley, W. E. ; Shi, X. ; Dusa, M. V. ; Petersen, J. S. ; Chen, F. ; Wampler, K. E. ; Laidig, T. L. ; Caldwell, R. F.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.290-314,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
3.

Conference Proceedings
Conference Proceedings
3. Halftone biasing OPC technology: an approach for achieving fine bias control on raster-scan systems
Nakagawa, K. H. ; Chen, J. F. ; Socha, R. J. ; Laidig, T. L. ; Wampler, K. E. ; Van Den Broeke, D. ; Dusa, M. V. ; Caldwell, R. F.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.315-323,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
4.

Conference Proceedings
Conference Proceedings
4. Full-chip manufacturing reliability check and correction (MRC2): a first step toward design for manufacturability with low k1 lithography
Hsu, M. ; Laidig, T. ; Wampler, K. E. ; Hsu, S. ; Shi, X. ; Chen, J. F. ; Van Den Broeke, D.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.382-393,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
5.

Conference Proceedings
Conference Proceedings
5. RET masks for the final frontier of optical lithography [5853-104]
Chen, J. F. ; Broeke, D. van den ; Hsu, S. ; Hsu, M. C.W. ; Laidig, T. ; Shi, X. ; Chen, T. ; Socha, R. J. ; Hollerbach, U. ; Wampler, K. E. ; Park, J. ; Park, S. ; Gronlund, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.168-179,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
6.

Conference Proceedings
Conference Proceedings
6. Contact and via hole mask design optimization for 65-nm technology node
Van Den Broeke, D. ; Shi, X. ; Socha, R. ; Laidig, T. ; Hollerbach, U. ; Wampler, K. E. ; Hsu, S. ; Chen, J. F. ; Corcoran, N. P. ; Dusa, M. V. ; Park, J. C.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.680-690,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
7.

Conference Proceedings
Conference Proceedings
7. OPC model calibration for CPL patterning at extreme low k1
Shi, X. ; Laidig, T. ; Chen, J. F. ; Van Den Broeke, D. ; Hsu, S. ; Hsu, M. ; Wampler, K. E. ; Hollerbach, U. ; Park, J. C. ; Yu, L.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.614-625,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567