1.

Conference Proceedings
Conference Proceedings
1. Investigation of polarization effects on new mask materials
Itakura, Y. ; Kawasa, Y. ; Wakabayashi, O. ; Moriya, M. ; Nagai, S. ; Sumitani, A. ; Hagiwara, T. ; Ishimaru, T. ; Tsuji, S. ; Fujii, K. ; Wakamiya, W.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.587-598,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography
Hori, T. ; Yabu, T. ; Ishihara, T. ; Watanabe, T. ; Wakabayashi, O. ; Sumitani, A. ; Kakizaki, K. ; Mizoguchi, H.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1285-1292,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. Development and evaluation of an F2 laser for immersion interference lithography at 157 nm
Itakura, Y. ; Kawasa, Y. ; Wakabayashi, O. ; Moriya, M. ; Nagai, S. ; Sumitani, A. ; Hagiwara, T. ; Ishimaru, T. ; Tsuji, S. ; Fujii, K. ; Wakamiya, W.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1269-1278,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
4.

Conference Proceedings
Conference Proceedings
4. GT40A: durable 45-W ArF injection-lock laser light source fordryjimmersion lithography [6154-99]
Tanaka, S. ; Tsushima, H. ; Nakaike, T. ; Yamazaki, T. ; Saito, T. ; Tomaru, H. ; Kakizaki, K. ; Matsunaga, T. ; Suzuki, T. ; Wakabayashi, O. ; Nagai, S. ; Fujimoto, J. ; Inoue, T. ; Mizoguchi, H
Pub. info.: Optical Microlithography XIX.  pp.61542O-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
5.

Conference Proceedings
Conference Proceedings
5. Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation
Saito, T. ; Suzuki, T. ; Yoshino, M. ; Wakabayashi, O. ; Matsunaga, T. ; Fujimoto, J. ; Kakizaki, K. ; Yamazaki, T. ; Inoue, T. ; Terashima, K. ; Enami, T. ; Inoue, H. ; Sumitani, A. ; Tomaru, H. ; Mizoguchi, H.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1704-1711,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
6.

Conference Proceedings
Conference Proceedings
6. Spectral metrologies for ultra-line-narrowed F2 laser
Nakaike, T. ; Wakabayashi, O. ; Suzuki, T. ; Mizoguchi, H. ; Nakao, K. ; Nohdomi, R. ; Ariga, T. ; Kitatochi, N. ; Suganuma, T. ; Kumazaki, T. ; Hotta, K. ; Yoshioka, M.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1714-1721,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
7.

Conference Proceedings
Conference Proceedings
7. Beam quality of a new-type MOPO laser system for VUV laser lithography
Wakabayashi, O. ; Ariga, T. ; Kumazaki, T. ; Sasano, K. ; Watanabe, T. ; Yabu, T. ; Hori, T. ; Kakizaki, K. ; Sumitani, A. ; Mizoguchi, H.
Pub. info.: Optical Microlithography XVII.  pp.1772-1780,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
8.

Conference Proceedings
Conference Proceedings
8. Development of high-power ArF/F2 laser platform for VUV microlithography
Kakizaki, K. ; Fujimoto, J. ; Yamazaki, T. ; Suzuki, T. ; Matsunaga, T. ; Kawasuji, Y. ; Watanabe, Y. ; Kaminishi, M. ; Inoue, T. ; Mizoguchi, H. ; Kumazaki, T. ; Ariga, T. ; Watanabe, T. ; Yabu, T. ; Sasano, K. ; Hori, T. ; Wakabayashi, O. ; Sumitani, A.
Pub. info.: Optical Microlithography XVII.  pp.1805-1814,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
9.

Conference Proceedings
Conference Proceedings
9. Highly durable 4-kHz ArF excimer laser G42A for sub-90-nm lithography
Saito, T. ; Inoue, H. ; Nagano, H. ; Yoshino, M. ; Wakabayashi, O. ; Nohdomi, R. ; Nishisaka, T. ; Sumitani, A. ; Tomaru, H. ; Mizoguchi, H.
Pub. info.: Optical Microlithography XVII.  pp.1727-1734,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
10.

Conference Proceedings
Conference Proceedings
10. Spectral dynamics analysis of utlra-line-narrowed F2 laser
Kumazaki, T. ; Wakabayashi, O. ; Nohdomi, R. ; Ariga, T. ; Watanabe, H. ; Hotta, K. ; Mizoguchi, H. ; Tanaka, H. ; Takahashi, A. ; Okada, T.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1363-1370,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040