1.

Conference Proceedings
Conference Proceedings
1. Application of alternating phase shift mask to device fabrication
S.-G. Kim ; S.-G. Woo ; W.-S. Han ; Y.-B. Koh ; M.-Y. Lee
Pub. info.: Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California.  pp.515-523,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2440
2.

Conference Proceedings
Conference Proceedings
2. Optical proximity correction using a transmittance-controlled mask (TCM)
W.-S. Han ; C.-J. Sohn ; Y.-B. Kim ; K.-H. Kim ; H.-K. Kang
Pub. info.: Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California.  pp.494-505,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2440
3.

Conference Proceedings
Conference Proceedings
3. Fidelity comparison of island patterns with different types of illuminations and phase shift masks
S.-Y. Moon ; W.-S. Han ; S.-G. Woo ; C.-J. Sohn ; C.-H. Kim
Pub. info.: Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California.  pp.784-795,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2440
4.

Conference Proceedings
Conference Proceedings
4. Dependency of side-lobe effect of half-tone phase-shift mask on substrate material and topology and its solutions
S.-C. Lim ; S.-G. Woo ; W.-S. Han ; Y.-B. Koh ; M.-Y. Lee
Pub. info.: Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan.  pp.372-383,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2512