1.

Conference Proceedings
Conference Proceedings
1. Non-chemically amplified resists for 193 nm lithography
I. Nishimura ; W. H. Heath ; K. Matsumoto ; W.-L. Jen ; S. S. Lee
Pub. info.: Advances in resist materials and processing technology XXV.  1  pp.69231C-1-69231C-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923
2.

Conference Proceedings
Conference Proceedings
2. High resolution nanoimprint templates for dual damascene: fabrication and imprint results
M. lrmscher ; J. Butschke ; R. Carpio ; B. Chao ; W.-L. Jen
Pub. info.: Emerging lithographic technologies XII.  1  pp.69210D-1-69210D-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921
3.

Conference Proceedings
Conference Proceedings
3. Dual damascene BEOL processing using multilevel step and flash imprint lithography
H. Chao ; F. Palmieri ; W.-L. Jen ; D. H. McMichael ; C. G. Willson
Pub. info.: Emerging lithographic technologies XII.  1  pp.69210C-1-69210C-14,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921