1.

Conference Proceedings
Conference Proceedings
1. Integrating immersion lithography in 45-nm logic manufacturing
M. Benndorf ; S. Warrick ; W. Conley ; D. Cruau ; D. DeSimone ; K. Mestadi ; V. Farys ; J. Gemmink
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Early look into device level imaging with beyond water immersion
W. Conley ; S. Warrick ; C. Garza ; P. Goirand ; J. Gemmink ; D. V. Steenwinckel
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
3.

Conference Proceedings
Conference Proceedings
3. 32-nm SOC printing with double patterning, regular design, and 1.2 NA immersion scanner
Y. Trouiller ; V. Farys ; A. Borjon ; J. Belledent ; C. Couderc ; F. Sundermann ; J. Urbani ; Y. Rody ; C. Gardin ; J. Planchot ; W. Conley ; P. Goirand ; S. Warrick ; F. Robert ; G. Kerrien ; F. Vautrin ; B. Wilkinson ; M. Saied ; E. Yesilada ; P. Montgomery ; L. L. Cam ; C. Martinelli
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
4.

Conference Proceedings
Conference Proceedings
4. Extending immersion lithography to the 32-nm node
S. Warrick ; W. Conley ; V. Farys ; M. Benndorf ; J. Gemmink ; Y. Trouiller ; J. Belledent ; D. Jovanovic ; P. Gouraud
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
5.

Conference Proceedings
Conference Proceedings
5. Novel high-index resists for 193-nm immersion lithography and beyond
I. Blakey ; L. Chen ; B. Dargaville ; H. Liu ; A. Whittaker ; W. Conley ; E. Piscani ; G. Rich ; A. Williams ; P. Zimmerman
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
6.

Conference Proceedings
Conference Proceedings
6. The application of high-refractive index photoresist for 32-nm device level imaging
W. Conley
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
7.

Conference Proceedings
Conference Proceedings
7. Investigation of hyper-NA scanner emulation for photomask CDU performance
E. Poortinga ; T. Scheruebl ; W. Conley ; F. Sundermann
Pub. info.: EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6533
8.

Conference Proceedings
Conference Proceedings
8. Outlook for potential third-generation immersion fluids
J. Lopez-Gejo ; J. T. Kunjappu ; J. Zhou ; B. W. Smith ; P. Zimmerman ; W. Conley ; N. J. Turro
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519