1.

Conference Proceedings
Conference Proceedings
1. Design and Yield of 9 kV Unipolar Normally-ON Vertical-Channel SiC JFETs
V. Veliadis ; E.J. Stewart ; H. Hearne ; T. McNutt ; W. Chang
Pub. info.: Silicon Carbide and Related Materials 2010 : Selected, peer reviewed papers from the 8th European Conference on Silicon Carbide and Related Materials (ECSCRM 2010), held in Oslo (Sundvolden Conference Centre), Norway, August 29th - September 2nd.  pp.617-620,  2011.  Aedermannsdorf, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 679-680
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Conference Proceedings
Conference Proceedings
2. Recovery of Bipolar-Current Induced Degradations in High-Voltage Implanted-Gate Junction Field Effect Transistors
V. Veliadis ; H. Hearne ; W. Chang ; J.D. Caldwell ; E.J. Stewart
Pub. info.: Silicon carbide and related materials 2011 : selected, peer reviewed papers from the 14th International Conference on Silicon Carbide and Related Materials 2011 (ICSCRM 2011), September 11-16, 2011, Cleveland, Ohio, USA.  pp.1013-1016,  2012.  Aedermannsdorf, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 717-720
3.

Conference Proceedings
Conference Proceedings
3. Design and Fabrication of 64x64 MWIR LED Array for Infrared Scene Simulation
N.C. Das ; W. Chang
Pub. info.: State-of-the-Art Program on Compound Semiconductors 48 (SOTAPOCS 48) and ZnO, InZnO, and InGaO Related Materials and Devices for Electronic and Photonic Applications.  pp.93-96,  2008.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 13(3)
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Conference Proceedings
Conference Proceedings
4. Si-Graphite Composite as a New Anode Material for Lithium Secondary Batteries
K. Lee ; O. Kwon ; Y. Lee ; W. Chang ; K. Kim
Pub. info.: Rechargeable Lithium and Lithium-Ion Batteries.  pp.73-77,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(26)
5.

Conference Proceedings
Conference Proceedings
5. Characteristics and prevention of pattern collapse in EUV lithography
W. Chang ; E. Kim ; Y. Kang ; S. Park ; C. Lim ; K. Won ; J. Kim ; H. Oh
Pub. info.: Emerging lithographic technologies XI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6517
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Conference Proceedings
Conference Proceedings
6. 32-nm pattern collapse modeling with radial distance and rinse speed
J. Kim ; W. Chang ; S. Park ; H. Oh ; S. Lee ; S. Kim
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
7.

Conference Proceedings
Conference Proceedings
7. A thick CESL stressed ultra-small (Lg=40-nm) SiGe-channel MOSFET fabricated with 193-nm scanner lithography and TEOS hard mask etching
W. Liao ; T. Chen ; H. Lin ; W. Chang ; T. Shih ; H. Tsen ; L. Chung
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
8.

Conference Proceedings
Conference Proceedings
8. A thin FinFET Si-fin body structure fabricated with 193-nm scanner photolithography and composite hard mask etching technique upon bulk-Si substrate
W. Liao ; Y. Liu ; W. Chang ; T. Chen ; T. Shih ; H. Tsen ; L. Chung
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
9.

Conference Proceedings
Conference Proceedings
9. Process latitude dependency on local photomask haze defect in 70-nm binary intensity mask
Y. -M. Kang ; S. -J. Kim ; J. -B. Park ; W. Chang ; S. -W. Park ; J. -S. Kim ; H. -K. Cho ; H. -K. Oh
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
10.

Conference Proceedings
Conference Proceedings
10. Algorithm of image fusion based on finite ridgelet transform
K. Liu ; L. Guo ; W. Chang ; H. Li
Pub. info.: MIPPR 2007.  1  pp.67860D-1-67860D-7,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6786