Howard, W. ; Tirapu Azpiroz, J. ; Xiong, Y. ; Mack, C. ; Verma, G. ; Volk, W. ; Lehon, H. ; Deng, Y. ; Shi, R. ; Culp, J. ; Mansfield, S.
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Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA. pp.61-72, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Su, B. ; Ma, M. ; Vikram, A. ; Volk, W. ; Du, H. ; Verma, G. ; Morse, R. ; Chu, C. ; Tsao, B. ; Lin, C. ; Chou, J. ; Tsai, S.
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Photomask and Next-Generation Lithography Mask Technology XIII. pp.62830Q-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Hsu, S. ; Chu, T. -B. ; Van Den Broeke, D. ; Chen, J. F. ; Hsu, M. ; Corcoran, N. P. ; Volk, W. ; Ruch, W. E. ; Sier, J. -P. ; Hess, C. E. ; Lin, B. ; Yu, C. C. ; Huang, G.
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24th Annual BACUS Symposium on Photomask Technology. pp.711-722, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering