1.

Conference Proceedings
Conference Proceedings
1. Near-infrared photodetectors based on a HgInTe-semiconductor compound
Malik,A. ; Vieira,M. ; Fernandes,M. ; Macarico,F. ; Grushka,Z.M.
Pub. info.: Photodetectors : materials and devices IV : 27-29 January 1999, San Jose, California.  pp.433-442,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3629
2.

Conference Proceedings
Conference Proceedings
2. Wide-spectral-response photodetectors based on microcrystalline hydrogenated silicon thin films
Vieira,M. ; Fantoni,A. ; Koynov,S. ; Schwarz,R.
Pub. info.: Photodetectors : materials and devices II : 12-14 February 1997, San Jose, California.  pp.183-192,  1997.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2999
3.

Conference Proceedings
Conference Proceedings
3. Performance degradation of microcrystalline and amorphous silicon-based p-i-n detectors upon He4 irradiation
Schwarz,R. ; Vieira,M. ; Macarico,A. ; Koynov,S. ; Cardoso,S. ; Soares,J.C.
Pub. info.: Defects in semiconductors, icds-19 : proceedings of the 19th International Conference on Defects in Semiconductors, Aveiro, Portugal, July 1997.  Part1  pp.593-598,  1997.  Zurich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 258-263
4.

Conference Proceedings
Conference Proceedings
4. Numerical simulation of a/ｦﾌc-Si:H p-I-n photodiode under nonuniform illumination:a 2D transport problem
Fantoni,A. ; Vieira,M. ; Cruz,J. ; Martins,R.
Pub. info.: Integrated Optics Devices: Potential for Commercialization.  pp.234-243,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2997
5.

Conference Proceedings
Conference Proceedings
5. Characterization of quartz-etched PSM masks for KrF lithography at the 100-nm node
Rhyins,P. ; Fritze,M. ; Chan,D. ; Carney,C. ; Blachowicz,B.A. ; Vieira,M. ; Mack,C.A.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.486-495,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562