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20 results

Conference Proceedings

1. SURFACE CHARACTERISATION OF Si AFTER HF TREATMENTS AND ITS INFLUENCE ON THE DIELECTRIC BREAKDOWN OF THERMAL OXIDES

Verhaverbeke, S. ; Alay, J. ; Mertens, P. ; Meuris, M. ; Heyns, M. ; Vandervorst, W. ; Murrell, M. ; Sofield, C.

Pub. info.:	Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.. pp.391-398, 1992. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	259

Conference Proceedings

2. ALTERNATIVE METHODS FOR RESIST STRIPPING

Wei, J. ; Verhaverbeke, S.

Pub. info.:	Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.496-504, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-35

Conference Proceedings

3. Advanced Wet Cleaning Technology For Highly Reliable Thin Oxides

Verhaverbeke, S. ; Meuris, M. ; Mertens, P. ; Schmidt, H. ; Heyns, M.M. ; Philipossian, A. ; Graeff, D. ; Dillenbeck, K.

Pub. info.:	Proceedings of the fourth International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology/1993. pp.199-219, 1993. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1993-13

Conference Proceedings

4. A HF VAPOUR ETCH PROCESS FOR INTEGRATION IN CLUSTER-TOOL PROCESSES: CHARACTERISTICS AND APPLICATIONS

Vermeulen, W.J.C. ; Kwakman, L.F.Tz. ; Werkhoven, C.J. ; Granneman, E.H.A. ; Verhaverbeke, S. ; Heyns, M.

Pub. info.:	Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.241-252, 1994. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1994-7

Conference Proceedings

5. HYDROGEN PASSIVATION OF HF-LAST CLEANED (100) SILICON SURFACES: A MIR-FTIR STUDY

Bender, H. ; Verhaverbeke, S. ; Heyns, M.M.

Pub. info.:	Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.186-194, 1994. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1994-7

Conference Proceedings

6. Advanced processes for photomask damage-free cleaning and photoresist removal [6281-26]

Papanu, S. J. ; Gouk, R. ; Chen, -W. H. ; Boelen, P. ; Peters, P. ; Belisle, M. ; Verhaverbeke, S. ; Ko, A. ; Child, K. ; Martinez, E.

Pub. info.:	EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany. pp.62810K-, 2006. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6281

Conference Proceedings

7. THE ROLE OF THE PEROXIDE ANION AS AN OXIDIZER IN SC-1 SOLUTIONS

Verhaverbeke, S. ; Parker, J.

Pub. info.:	Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.184-192, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-35

Conference Proceedings

8. AQUEOUS SINGLE PASS SINGLE WAFER AI/VIA CLEANING

Verhaverbeke, S. ; Beaudry, C. ; Boelen, P.

Pub. info.:	Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.23-26, 2003. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-26

Conference Proceedings

9. NEW SHORT CYCLE WET CLEANING CONCEPT FOR 300 mm FABRICATION LINE

Verhaverbeke, S. ; Truman, K.

Pub. info.:	Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.31-36, 2001. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2001-26

10.

Conference Proceedings

10. CRITICAL ASPECTS OF WAFER CLEANING AND GATE OXIDE INTEGRITY

Mertens, P.W. ; Meuris, M. ; Schmidt, H.F. ; Verhaverbeke, S. ; Heyns, M.M. ; Carr, P. ; Graeff, D. ; Schnegg, A. ; Kubota, M. ; Dillenbeck, K. ; de Blank, R.

Pub. info.:	Proceedings of the Satellite Symposium to ESSDERC 93 Grenoble/France : crystalline defects and contamination: their impact and control in device manufacturing. pp.87-102, 1993. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1993-15

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