van Dal, M.J.H. ; Lauwers, A. ; Cunniffe, J. ; Verbeeck, R. ; Vrancken, C. ; Demeurisse, C. ; Dao, T. ; Tamminga, Y. ; Veloso, A. ; Kittl, J.A. ; Maex, K.
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Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.233-240, 2005. Pennington, NJ. Electrochemical Society
Kittl, J. A. ; Lauwers, A. ; Pawlak, M. A. ; Demeurisse, C. ; Anil, K. G. ; Veloso, A. ; van Dal, M. J. H. ; Schram, T. ; Brijs, B. ; Kaiser, M. ; Kubicek, S. ; Cunniffe, J. ; Verbeeck, R. ; Vrancken, C. ; Biesemans, S. ; Maex, K.
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Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.225-232, 2005. Pennington, NJ. Electrochemical Society
Wang, Q.F. ; Lauwers, A. ; Deweerdt, B. ; Verbeeck, R. ; Maex, K.
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ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology. pp.519-524, 1995. Pennington, NJ. Electrochemical Society
Lauwers, A. ; Vercaemst, A. ; Hove, M. Van ; Larsen, K. Kyllesbech ; Verbeeck, R. ; Meirhaeghe, R. Van ; Maex, K. ; Rossum, M. Van
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Silicides, germanides, and their interfaces : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.. pp.59-, 1994. Pittsburgh, PA. MRS - Materials Research Society
Witvrouw, A. ; Bosscher, W. De ; Deweerdt, B. ; Verbeeck, R. ; Loosen, F. ; Roussel, Ph. ; Maex, K.
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Thin films : stresses and mechanical properties IV : symposium held April 12-16, 1993, San Francisco, California, U.S.A.. pp.51-, 1993. Pittsburgh, Pa.. MRS - Materials Research Society