1.

Conference Proceedings
Conference Proceedings
1. (Sub-) 100-nm gate patterning using 248-nm alternating PSM
Vandenberghe,G.N. ; Jaenen,P. ; Jonckheere,R.M. ; Ronse,K. ; Toublan,O.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.61-69,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
2.

Conference Proceedings
Conference Proceedings
2. Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM
Kim,Y.-C. ; Vandenberghe,G.N. ; Verhaegen,S. ; Ronse,K.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.954-967,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
3.

Conference Proceedings
Conference Proceedings
3. SPM characterizaton of anomalies in phase-shift mask and their effect on wafer features
Muckenhirn,S. ; Meyyappan,A. ; Walch,K. ; Maslow,M.J. ; Vandenberghe,G.N. ; Wingerden,J.Van
Pub. info.: Metrology, inspection, and process control for microlithography XV.  pp.188-199,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
4.

Conference Proceedings
Conference Proceedings
4. Performance optimization of the double-exposure slternating PSM for (sub-) 100-nm ICs
Vandenberghe,G.N. ; Driessen,F. ; Adrichem,P.J.van ; Ronse,K. ; Li,J. ; Karklin,L.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.394-405,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
5.

Conference Proceedings
Conference Proceedings
5. Reticle quality needs for advanced 193-nm lithography
Jonckheere,R.M. ; Vandenberghe,G.N. ; Wiaux,V. ; Verhaegen,S. ; Ronse,K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.108-117,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
6.

Conference Proceedings
Conference Proceedings
6. Model-based OPC for first-generation 193-nm lithography
Lucas,K.D. ; Word,J.C. ; Vandenberghe,G.N. ; Verhaegen,S. ; Jonckheere,R.M.
Pub. info.: Optical Microlithography XIV.  4346  pp.119-130,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
7.

Conference Proceedings
Conference Proceedings
7. ArF lithography options for 100-nm technologies
Vandenberghe,G.N. ; Kim,Y.-C. ; Delvaux,C. ; Lucas,K.D. ; Choi,S.-J. ; Ercken,M. ; Ronse,K. ; Vleeming,B.
Pub. info.: Optical Microlithography XIV.  4346  pp.179-190,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
8.

Conference Proceedings
Conference Proceedings
8. Process optimization for sub-100-nm gate patterns using phase edge lithography
Schenau,K.van Ingen ; Vleeming,B. ; Ansem,W.F.Gehoel-van ; Wong,P. ; Vandenberghe,G.N.
Pub. info.: Advances in resist technology and processing XVIII.  4345  pp.200-210,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345