1.

Conference Proceedings
Conference Proceedings
1. CD control comparison for sub-0.18-ｦﾌm patterning using 248-nm lithography and strong resolution enhancement techniques
Vandenberghe,G. ; Marschner,T. ; Ronse,K. ; Socha,R.J. ; Dusa,M.V.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.228-238,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. KrF lithography for 130 nm
Finders,J. ; Schoot,J.B.van ; Vanoppen,P. ; Dusa,M.V. ; Socha,R.J. ; Vandenberghe,G. ; Ronse,K.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.192-205,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Proximity-bias swing: origin and characterization
Zandbergen,P. ; Gehoel-van,Ansem,W. ; de Klerk,J. ; Vandenberghe,G. ; Linskens,F.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 2  pp.837-844,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
4.

Conference Proceedings
Conference Proceedings
4. Recent trends and progress in deep-UV lithography
Ronse,K. ; Goethals,A.M. ; Vandenberghe,G. ; Maenhoudt,M.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.34-39,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
5.

Conference Proceedings
Conference Proceedings
5. Status of ArF lithography for the 130-nm technology node
Ronse,K. ; Vandenberghe,G. ; Jaenen,P. ; Delvaux,C. ; Vangoidsenhoven,D. ; Roey,F.Van ; Pollers,I. ; Maenhoudt,M. ; Goethals,A.M. ; Pollentier,I.K. ; Vleeming,B. ; Schenau,K.van lngen ; Heskamp,B. ; Davies,G. ; Niroomand,A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.410-422,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
6.

Conference Proceedings
Conference Proceedings
6. Characterization and optimization of positive-tone DUV resists on TiN substrates
Zandbergen,P. ; Ansem,W.Gehoel-van ; Vandenberghe,G. ; Driessche,V.Van ; Vloeberghs,H.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.314-323,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
7.

Conference Proceedings
Conference Proceedings
7. Reticle imaging and metrology using a CD-SEM at IMEC
James,A. ; Felten,F. ; Polli,M. ; England,J.G. ; Marschner,T. ; Vandenberghe,G.
Pub. info.: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany.  pp.128-133,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3996
8.

Conference Proceedings
Conference Proceedings
8. Bottom-ARC optimization methodology for O.25-ｦﾌm lithography and beyond
Op,de,Beeck,M. ; Vandenberghe,G. ; Jaenen,P. ; Zhang,F.-H. ; Delvaux,C. ; Richardson,P. ; van,Puyenbroeck,I. ; Ronse,K. ; Lamb,III,J.E. ; van,der,Hilst,J.B.C. ; van,Wingerden,J.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.322-336,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
9.

Conference Proceedings
Conference Proceedings
9. Optical proximity effects correction at 0.25ｦﾌm incorporating process variations in lithography
Tritchkov,A. ; Rieger,M.L. ; Stirniman,J.P. ; Yen,A. ; Ronse,K. ; Vandenberghe,G. ; hove,L.Van den
Pub. info.: Optical Microlithography X.  pp.726-738,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
10.

Conference Proceedings
Conference Proceedings
10. NA/o optimization strategies for an advanced DUV stepper applied to 0.25-ｦﾌm and sub-0.25-ｦﾌm critical levels
Beeck,M.Op de ; Ronse,K. ; Ghandehari,K. ; Jaenen,P. ; Botermans,H. ; Finders,J. ; Lilygren,J.A. ; Baker,D.C. ; Vandenberghe,G. ; Bisschop,P.De ; Maenhoudt,M. ; hove,L.Van den
Pub. info.: Optical Microlithography X.  pp.320-332,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051