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OPC technology road map to 0.14-ｦﾌm design rules

Author(s):
Chen,J.F. ( MicroUnity Systems Engineering,Inc. )
Laidig,L. ( MicroUnity Systems Engineering,Inc. )
Wampler,K.E. ( MicroUnity Systems Engineering,Inc. )
Caldwell,R.F. ( MicroUnity Systems Engineering,Inc. )
Naderi,A.R. ( Photronics,Inc. )
Van Den Broeke,D. ( Photronics,Inc. )
1 more
Publication title:
17th Annual BACUS Symposium on Photomask Technology and Management
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3236
Pub. Year:
1998
Page(from):
382
Page(to):
396
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426697 [0819426695]
Language:
English
Call no.:
P63600/3236
Type:
Conference Proceedings

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