1.

Conference Proceedings
Conference Proceedings
1. Manufacturability issues with double patterning for 50-nm half-pitch single damascene applications using RELACS shrink and corresponding OPC
M. O. de Beeck ; J. Versluijs ; V. Wiaux ; T. Vandeweyer ; I. Ciofi ; H. Struyf ; D. Hendrickx ; J. V. Olmen
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Split and design guidelines for double patterning
V. Wiaux ; S. Verhaegen ; S. Cheng ; F. Iwamoto ; P. Jaenen
Pub. info.: Optical Microlithography XXI.  1  pp.692409-1-692409-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
3.

Conference Proceedings
Conference Proceedings
3. Printability verification for double-patterning technology
G. Luk-Pat ; P. Panaite ; K. Lucas ; C. Cork ; V. Wiaux
Pub. info.: Photomask technology 2008.  1  pp.71220Q-1-71220Q-11,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7122
4.

Conference Proceedings
Conference Proceedings
4. A methodology for double patterning compliant split and design
V. Wiaux ; S. Verhaegen ; F. Iwamoto ; M. Maenhoudt ; T. Matsuda
Pub. info.: Lithography Asia 2008.  1  pp.71401X-1-71401X-14,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
5.

Conference Proceedings
Conference Proceedings
5. Double patterning design split implementation and validation for the 32nm node
M. Drapeau ; V. Wiaux ; E. Hendrickx ; S. Verhaegen ; T. Machida
Pub. info.: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6521
6.

Conference Proceedings
Conference Proceedings
6. Double pattern EDA solutions for 32nm HP and beyond
G. E. Bailey ; A. Tritchkov ; J. Park ; L. Hong ; V. Wiaux ; E. Hendrickx ; S. Verhaegen ; P. Xie ; J. Versluijs
Pub. info.: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6521
7.

Conference Proceedings
Conference Proceedings
7. Lithography options for the 32nm half pitch node and their implications on resist and material technology
Q. Gronheid ; E. Hendrickx ; V. Wiaux ; M. Maenhoudt ; M. Goethals
Pub. info.: Quantum optics, optical data storage, and advanced microlithography : 12-14 November 2007, Beijing, China.  pp.68271V-1-68271V-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6827