How to obtain accurate resist simulations in very low-kl era- [6154-107]
- Author(s):
Chiou T. B ( Asml TDC Asia (Taiwan) ) Park C. H ( Hynix Semiconductor Inc. (South Korea) ) Choi, J. S ( Hynix Semiconductor Inc. (South Korea) ) Min Y.-H ( ASML TDC Asia (Taiwan) ) Hansen S ( ASML TDC USA (USA) ) Tseng S. E ( ASML TDC Asia (Taiwan) ) Chen A C ( ASML TDC Asia (Taiwan) ) Yim D ( Hynix Semiconductor Inc. (South Korea) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 61542V
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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