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17 results

Conference Proceedings

1. AN ASSESSMENT OF ECR ARGON PLASMA ETCHING DAMAGE ON Si AND SiO2 INTERFACES

Nam, C. W. ; Ashok, S. ; Tsai, W. ; Day, M.E.

Pub. info.:	Beam-solid interactions : fundamentals and applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A.. pp.861-868, 1993. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	279

Conference Proceedings

2. PLASMA DIAGNOSTICS AND MODELING OF Ti/Tn REACTIVE SPUTTERING

Tsai, W. ; Fair, J. ; Hodul, D.

Pub. info.:	Advanced metallization and processing for semiconductor devices and circuits--II : symposium held April 27-May 1, 1992, San Francisco, California, U.S.A.. pp.793-798, 1992. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	260

Conference Proceedings

3. 32 Metal Gated Self-aligned Gate-forward nMOSFET with 〓0.8 nm EOT Fabricated by In-Situ Ar/O2 Plasma Oxidation of PVD Hf

Koveshnikov, S. ; Tsai, W. ; Zhang, M. ; Choi, C. ; Lee, J.

Pub. info.:	Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.274-281, 2005. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-05

Conference Proceedings

4. Highly Selective Etch of SiO2 for High Aspect Ratio Sub-0.5 um Holes

Zhu, H. ; Mueller, G. ; Nguyen, T. ; Tsai, W.

Pub. info.:	Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes. pp.115-120, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-30

Conference Proceedings

5. INTEGRATION ISSUES OF POLYSILICON WITH HIGH K DIELECTRICS DEPOSITED BY ATOMIC LAYER CHEMICAL VAPOR DEPOSITION

Tsai, W. ; Chen, I. ; Carter, R. ; Cartier, E. ; Kluth, J. ; Richard, O. ; Claes, M. ; Lin, Y.M. ; Nohira, H. ; Conard, T. ; Caymax, M. ; Young, E. ; Vandervorst, W. ; DeGendt, S. ; Heyns, M. ; Manabe, Y. ; Maes, J.W. ; Rittersma, Z.M. ; Besling, W. ; Roozeboom, F.

Pub. info.:	Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology. pp.747-760, 2002. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2002-2

Conference Proceedings

6. INTEGRATION OF HIGH-k GATE DIELECTRICS - WET ETCH CLEANING AND SURFACE CONDITIONING

De Gendt, S. ; Beckx, S. ; Caymax, M. ; Claes, M. ; Conard, T. ; Delabie, A. ; Deweerd, W. ; Hellin, D. ; Kraus, H. ; Onsia, B. ; Parishev, V. ; Puurunen, R. ; Rohr, E. ; Snow, J. ; Tsai, W. ; Van Doome, P. ; Van Elshocht, S. ; Vertommen, J. ; Witters, T. ; Heyns, M.

Pub. info.:	Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.67-77, 2003. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-26

Conference Proceedings

7. Simulation of Uniformity and Lifetime Effects in Collimated Sputtering

Tait, R. N. ; Dew, S. K. ; Tsai, W. ; Hodul, D. ; Brett, M. J. ; Smy, T.

Pub. info.:	Rapid thermal and integrated processing IV : symposium held April 17-20, 1995, San Francisco, California, U.S.A.. pp.107-, 1995. Pittsburgh, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	387

Conference Proceedings

8. EFFECTS OF LOW-TEMPERATURE SURFACE CLEANING USING ECR HYDROGEN PLASMA

Nam, C. W. ; Ashok, S. ; Tsai, W. ; Day, M. E.

Pub. info.:	Surface chemical cleaning and passivation for semiconductor processing. pp.279-, 1993. Pittsburgh, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	315

Conference Proceedings

9. Simulation of Uniformity and Lifetime Effects in Collimated Sputtering

Tait, R. N. ; Dew, S. K. ; Tsai, W. ; Hodul, D. ; Brett, M. J. ; Smy, T.

Pub. info.:	Modeling and simulation of thin-film processing : symposium held April 17-20, 1995, San Francisco, California, U.S.A.. pp.373-, 1995. Pittsburgh. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	389

10.

Conference Proceedings

10. The Influence of Defects on Compatibility and Yield of the HfO2-PolySilicon Gate Stack for CMOS Integration

Kaushik, V. S. ; DeGendt, S. ; Carter, R. ; Claes, M. ; Rohr, E. ; Pantisano, L. ; Kluth, J. ; Kerber, A. ; Cosnier, V. ; Cartier, E. ; Tsai, W. ; Young, E. ; Green, M. ; Chen, J. ; Jang, S-A. ; Lin, S. ; Delabie, A. ; Elshocht, S. V. ; Manabe, Y. ; Richard, O. ; Zhao, C. ; Bender, H. ; Caymax, M. ; Heyns, M.

Pub. info.:	Crystalline oxide-silicon heterostructures and oxide optoelectronics : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.. pp.145-152, 2003. Warrendale, PA. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	747

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