1.

Conference Proceedings
Conference Proceedings
1. Reducing DfM to practice: the lithography manufacturability assessor [6156-19]
Liebmann, L. ; Mansfield, S. ; Han, G. ; Culp, J. ; Hibbeler, J. ; Tsai, R.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560K-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
2.

Conference Proceedings
Conference Proceedings
2. Feasibility of improving CD-SEM-based APC system for exposure tool by spectroscopic-ellipsometry-based APC system
Lin, W. ; Liao, S. ; Tsai, R. ; Yeh, M. ; Hsieh, C. ; Yu, Y. ; Lin, B. S. ; Fu, S. ; Dziura, T. G.
Pub. info.: Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA.  pp.138-144,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5755
3.

Conference Proceedings
Conference Proceedings
3. Dopants in Electroplated Copper
Andricacos, P.C. ; Parks, C. ; Cabral, C. ; Wachnik, R. ; Tsai, R. ; Maihotra, S. ; Locke, P. ; Fluegel, J. ; Horkans, J. ; Kwietniak, K. ; Uzoh, C. ; Rodbell, K.P. ; Gignac, L. ; Walton, E. ; Chung, D. ; Geffren, R.
Pub. info.: Electrochemical processing in ULSI fabrication and semiconductor/metal deposition II : proceedings of the international symposium.  pp.111-121,  1999.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-9
4.

Conference Proceedings
Conference Proceedings
4. CORRELATION BETWEEN Ti-SILICIDED SHALLOW JUNCTION DIODE LEAKAGE AND TITANIUM DIFFUSION DURING TiSi2 FORMATION
Nauka, K. ; Amano, J. ; Scott, M.P. ; Weber, E.R. ; Turner, J.E. ; Tsai, R.
Pub. info.: Materials issues in silicon integrated circuit processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A..  pp.319-324,  1986.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 71
5.

Conference Proceedings
Conference Proceedings
5. Low-Power, High Speed Sb-based HEMTs and HBTs
Mango, R. ; Boos, J. B. ; Campbell, P. M. ; Bennet, B. R. ; Glasser, E. R. ; Tinkham, B. P. ; Ancona, M. G. ; Hobart, K. D. ; Kruppa, W. ; Ikossi, K. ; Papanicolaou, N. A. ; Park, D. ; Shanabrook, B. V. ; Mittereder, J. ; Chang, W. ; Bass, R. ; Mohney, S. E. ; Wang, S. ; Robinson, J. ; Tsai, R. ; Barsky, M. ; Lange, M. D. ; Gutierrez, A.
Pub. info.: Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology.  pp.191-204,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-02
6.

Conference Proceedings
Conference Proceedings
6. Studies of the Relationship Between Megasonics, Surface Etching, and Particle Removal in SC-1 Solutions
Cohen, S. L. ; Rath, D. ; Lee, G. ; Furman, B. ; Pope, K. R. ; Tsai, R. ; Syverson, W. ; Gow, C. ; Liehr, M.
Pub. info.: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.13-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 386