Silicidation Strategy of Sub-0.1 ｦﾌm Junctions for Deep Submicron Devices

Silicidation Strategy of Sub-0.1 ｦﾌm Junctions for Deep Submicron Devices

Author(s):

Publication title:

Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

402

Pub. Year:

1996

Page(from):

245

Pub. info.:

Pittsburgh: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993051 [1558993053]

Language:

English

Call no.:

M23500/402

Type:

Conference Proceedings

Details

TDL ID:	ZA00019834
Series ID:	PA00000011
Conf. info. (Name):	Symposium on silicide thin films
Conf. info. (Number):	1995
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1995.11.27-1995.11.30

Similar Items:

1 Conference Proceedings Use of elevated source/drain structure in sub-0.1-ｦﾌm NMOSFETs Sun,J.J., Tsai,J.-Y., Yee,K.F., Osburn,C.M. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Measuring the effects of sub-0.1-ｦﾌm filtration on 248-nm photoresist performance Gotlinsky,B., Beach,J.V., Mesawich,M. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Response-surface-based optimization of 0.1-ｦﾌm PMOSFETs with ultrathin gate stack dielectrics Srivastava,A., Osburn,C.M. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Toward sub-0.1-ｦﾌm CD measurements using scatterometry Minhas,B.K., Prins,S.L., Naqvi,S.S.H., McNeil,J.R. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Evaluation of 2.0nm Grown and Deposited Dielectrics in 0.1ｦﾌm PMOSFETs Srivastava, A., Heinisch, H. H., Vogel, E., Parker, C., Osburn, C. M., Masnari, N. A., Wortman, J. J., Hauser, J. R. MRS - Materials Research Society	9 Conference Proceedings Mix-and-match lithography processes for 0.1-ｦﾌm MOS transistor device fabrication Yew,J.-Y., Chen,L.-J., Nakamura,K., Chao,T.-S., Lin,H.-C. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Self-heating as a tool for measuring sub-0.1-ｦﾌm silicon-on-insulator device parameters Osman,M.A., Osman,A.A. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Feasibility study to determine the suitability of using TiN/W and Si1-xGex as alternative gate materials for sub-0.1-ｦﾌm gate-length PMOS devices Murtaza,S.S., Hu,J.C., Unnikrishnan,S., Rodder,M., Chen,I.-C. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Antireflection strategies for sub-0.18-ｦﾌm dual-damascene structure patterning in KrF 248-nm lithography Chou,S.-Y., Wang,C.-M., Hsia,C.-C., Chen,L.-J., Hwang,G.-W., Lee,S.-D., Lou,J.-C. SPIE - The International Society for Optical Engineering	11 Conference Proceedings Customized off-axis illumination aperture filtering for sub-0.18-ｦﾌm KrF Lithography Hsia,C.-C., Gau,T.-S., Yang,C.-H., Liu,R.-C., Chang,C.-H., Chen,L.-J., Wang,C.-M., Chen,J.F., Smith,B.W., Hwang,G.-W., … SPIE - The International Society for Optical Engineering
6 Conference Proceedings Hot Carrier Reliability in Sub-0.1ｦﾌm nMOSFET Devices Saha, Samar K. MRS - Materials Research Society	12 Conference Proceedings Extendibility of Cu Damascene to 0.1 ｦﾌm Wide Interconnections Hu, C-K., Lee, K. Y., Gignac, L., Rossnagel, S. M., Uzoh, C., Chan, K., Roper, P., Harper, J. M. E. MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12