1.

Conference Proceedings
Conference Proceedings
1. Aliphatic platforms for the design of 157-nm chemically amplified resists
Ito, H. ; Truong, H.D. ; Okazaki, M. ; Miller, D.C. ; Fender, N. ; Breyta, G. ; Brock, P.J. ; Wallraff, G.M. ; Larson, C.E. ; Allen, R.D.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.18-28,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Evolution of a 193-nm bilayer resist for manufacturing
Kwong, R.W. ; Khojasteh, M. ; Lawson, P. ; Hughes, T. ; Varanasi, P.R. ; Brunsvold, B. ; Allen, R.D. ; Brock, P.J. ; Sooriyakumaran, R. ; Truong, H.D. ; Mahorowala, A.P. ; Medeiros, D.R.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.403-409,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
3.

Conference Proceedings
Conference Proceedings
3. Rational design in cyclic olefin resists for sub-100-nm lithography
Li, W. ; Varanasi, P.R. ; Lawson, M.C. ; Kwong, R.W. ; Chen, K.-J. ; Ito, H. ; Truong, H.D. ; Allen, R.D. ; Yamamoto, M. ; Kobayashi, E. ; Slezak, M.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.61-69,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039