1.

Conference Proceedings
Conference Proceedings
1. Reduction of mask-induced CD errors by optical proximity correction
Randall,J. ; Tritchkov,A. ; Jonckheere,R. ; Jaenen,P. ; Ronse,K.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.124-130,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Alternating PSM optimization using model-based OPC
Tritchkov,A. ; Stirniman,J.P. ; Rieger,M.L.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.556-566,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Automated OPC for application in advanced lithography(Invited Paper)
Ronse,K. ; Tritchkov,A. ; Randall,J. ; Jonckheere,R. ; Ghandehari,K. ; Van den hove,L.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.138-144,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
4.

Conference Proceedings
Conference Proceedings
4. Optical proximity effects correction at 0.25ｦﾌm incorporating process variations in lithography
Tritchkov,A. ; Rieger,M.L. ; Stirniman,J.P. ; Yen,A. ; Ronse,K. ; Vandenberghe,G. ; hove,L.Van den
Pub. info.: Optical Microlithography X.  pp.726-738,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
5.

Conference Proceedings
Conference Proceedings
5. Optical proximity effects and correction strategies for chemical-amplified DUV resists
Beeck,M.Op de ; Bruggeman,B. ; Botermans,H. ; Driessche,V.Van ; Yen,A. ; Tritchkov,A. ; Jonckheere,R. ; Ronse,K. ; hove,L.Van den
Pub. info.: Optical Microlithography IX.  Part2  pp.622-633,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
6.

Conference Proceedings
Conference Proceedings
6. Top-surface imaging and optical proximity correction:a way to 0.18-ｦﾌm lithography at 248 nm
Goethals,A.M. ; Vertommen,J. ; Roey,F.Van ; Yen,A. ; Tritchkov,A. ; Ronse,K. ; Jonckheere,R. ; hove,L.Van den
Pub. info.: Optical Microlithography IX.  Part1  pp.362-374,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726