1.

Conference Proceedings
Conference Proceedings
1. Reticle enhancement verification for the 65nm and 45nm nodes [6156-58]
Lucas, K. ; Patterson, K. ; Boone, R. ; Miramond, C. ; Borjon, A. ; Belledent, J. ; Toublan, O. ; Entradas, J. ; Trouiller, Y.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61560R-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
2.

Conference Proceedings
Conference Proceedings
2. Using the CODE technique to print complex two-dimensional structures in a 90-nm ground rule process
Manakli, S. ; Trouiller, Y. ; Toublan, O. ; Schiavone, P. ; Rody, Y.F. ; Goirand, P.J.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.205-213,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
3.

Conference Proceedings
Conference Proceedings
3. The impact of mask topography on binary reticles at the 65nm node
Word, J. ; Belledent, J. ; Trouiller, Y. ; Granik, Y. ; Toublan, O. ; Maurer, W.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.527-536,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
4.

Conference Proceedings
Conference Proceedings
4. CVD photoresist performance for 248-nm lithography
Monget, C. ; Joubert, O. P. ; Weidman, T. W. ; Toublan, O. ; Panabiere, J. -P. ; Weill, A. P.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.766-776,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
5.

Conference Proceedings
Conference Proceedings
5. Process optimization of a negative-tone CVD photoresist for 193-nm lithography applications
Joubert, O. P. ; Fuard, D. ; Monget, C. ; Schiavone, P. ; Toublan, O. ; Prola, A. ; Temerson, J. M. ; Inglebert, R. L. ; Weidman, T. W. ; Nault, M. P. ; Bekiaris, N.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.1371-1380,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
6.

Conference Proceedings
Conference Proceedings
6. The influence of calibration pattern coverage for lumped parameter resist models on OPC convergence [6156-50]
Niehoff, M. ; Shang, S. ; Toublan, O.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.615619-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
7.

Conference Proceedings
Conference Proceedings
7. Design verification flow for model-assisted double-dipole decomposition
Torres, J.A. ; Schellenberg, F.M. ; Toublan, O.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.585-592,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
8.

Conference Proceedings
Conference Proceedings
8. Process, design, and optical proximity correction requirements for the 65-nm device generation
Lucas, K. ; Montgomery, P. ; Litt, L.C. ; Conley, W. ; Postnikov, S.V. ; Wu, W. ; Yuan, C.-M. ; Olivares, M. ; Strozewski, K. ; Carter, R.L. ; Vasek, J. ; Smith, D. ; Fanucchi, E.L. ; Wiaux, V. ; Vandenberghe, G. ; Toublan, O. ; Verhappen, A. ; Kuijten, J.P. ; van Wingerden, J. ; Kasprowicz, B.S. ; Tracy, J.W. ; Progler, C.J. ; Shiro, E. ; Topouzov, I. ; Wimmer, K. ; Roman, B.J.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.353-364,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
9.

Conference Proceedings
Conference Proceedings
9. Investigation of model-based physical design restrictions(Invited Paper)
Lucas, K. ; Baron, S. ; Belledent, J. ; Boone, R. ; Borjon, A. ; Couderc, C. ; Patterson, K. ; Riviere-Cazaux, L. ; Rody, Y. ; Sundermann, F. ; Toublan, O. ; Trouiller, Y. ; Urbani, J. -C. ; Wimmer, K.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.85-96,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
10.

Conference Proceedings
Conference Proceedings
10. Modeling of electromagnetic effects from mask topography at full-chip scale
Borjon, A. ; Belledent, J. ; Shang, S. D. ; Toublan, O. ; Miramond, C. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Rody, Y. ; Sundermann, F. ; Urbani, J.-C. ; Baron, S. ; Trouiller, Y. ; Schiavone, P.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.498-505,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754