1.

Conference Proceedings
Conference Proceedings
1. Development of ZrSiO attenuated phase-shift mask for ArF excimer laser lithography
Fukuhara,N. ; Haraguchi,T. ; Kanayama,K. ; Matsuo,T. ; Takeuchi,S. ; Tomiyama,K. ; Saga,T. ; Hattori,Y. ; Ooshima,T. ; Otaki,M.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.979-986,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. High-resolution thickness measurements and evaluation of a photomask blank
Hirano,T. ; Matsuo,R. ; Tomiyama,K. ; Yazawa,I. ; Wada,H. ; Otaki,M. ; Omote,K.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.562-572,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873