1.

Conference Proceedings
Conference Proceedings
1. Critical procedure for OPC software benchmarking with maskshop consideration
Barberet,A. ; Galan,G. ; Fanget,G.L. ; Richoilley,J.-C. ; Tissier,M. ; Quere,Y.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.188-199,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
2.

Conference Proceedings
Conference Proceedings
2. CANARY:a high-sensitivity ESD test reticle design to evaluate potential risks in wafer fabs
Englisch,A. ; Hasselt,K.van ; Tissier,M. ; Wang,K.C.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.886-892,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Mask manufacturing contribution on 248-nm and 193-nm lithography performances
Barberet,A. ; Fanget,G.L. ; Richoilley,J.-C. ; Tissier,M. ; Quere,Y.
Pub. info.: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.90-98,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4349
4.

Conference Proceedings
Conference Proceedings
4. Mask manufacturing contribution on 248-nm and 193-nm lithography performances
Barberet,A. ; Fanget,G.L. ; Richoilley,J.-C. ; Tissier,M. ; Quere,Y.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.902-910,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
5.

Conference Proceedings
Conference Proceedings
5. Adjustment of optical proximity correction (OPC) software for mask process correction (MPC). Module 1: Optical mask writing tool simulation
Barberet,A. ; Fanget,G.L. ; Buck,P.D. ; Toublan,O. ; Richoilley,J.-C. ; Tissier,M.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.511-521,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
6.

Conference Proceedings
Conference Proceedings
6. Alternating phase-shift generation for complex circuit designs
Galan,G. ; Lalanne,F.P. ; Tissier,M. ; Belleville,M.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.508-519,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884