1.

Conference Proceedings
Conference Proceedings
1. Optimization of nanomachining repair condition for ArF lithography
Amano, T. ; Nishiguchi, M. ; Hashimoto, H. ; Morikawa, Y. ; Hayashi, N. ; White, R. ; Bozak, R. ; Terrill, L.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.538-545,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
2.

Conference Proceedings
Conference Proceedings
2. Defect repair performance using the nanomachining repair technique
Morikawa, Y. ; Kokubo, H. ; Nishiguchi, M. ; Hayashi, N. ; White, R. ; Bozak, R. ; Terrill, L.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.520-527,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Correlation of inspection methods in characterizing nanomachined photomask repairs
Csuy, J.E. ; Bozak, R.R. ; Terrill, L. ; White, R. ; Nishida, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.375-383,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446