Sudhama, C. ; Carrano, J.C. ; Parker, L.H. ; Chikarmane, V. ; Lee, J.C. ; Tasch, A.F. ; Miller, W. ; Abt, N. ; Shepherd, W.H.
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Ferroelectric thin films : symposium held April 16-20, 1990, San Francisco, California, U.S.A.. pp.331-336, 1990. Pittsburgh, Pa.. Materials Research Society
ULSI science and technology, 1997 : proceedings of the Sixth International Symposium on Ultralarge Scale Integration Science and Technology. pp.3-14, 1997. Pennington, NJ. Electrochemical Society
Sudhama, C. ; Kim, J. ; Chikarmane, V. ; Lee, J.C. ; Tasch, A.F. ; Myers, E.R. ; Novak, S.
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Ferroelectric thin films II : symposium held December 2-4, 1991, Boston, Massachusetts, U.S.A.. pp.147-154, 1992. Pittsburgh, Pa.. Materials Research Society
Li, D. ; lialarnurugan, G. ; Obradovic, B.J. ; Wang, G. ; Chen, Y. ; Tasch, A.F.
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Proceedings of the Fifth International Symposium of Process Physics and Modeling in Semiconductor Technology. pp.26-32, 1999. Pennington, New Jersey. Electrochemical Society
Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology. pp.438-452, 1996. Pennington, NJ. Electrochemical Society
Unnikrishnan, S. ; Kim, B.Y. ; Wang, C.L. ; Kwong, D.L. ; Tasch, A.F.
Pub. info.:
The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface. pp.744-752, 1996. Pennington, NJ. Electrochemical Society
ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology. pp.53-58, 1995. Pennington, NJ. Electrochemical Society
Morris, S. ; Lim, D. ; Yang, S.-H. ; Tian, S. ; Parab, K. ; Tasch, A.F.
Pub. info.:
Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology. pp.468-480, 1996. Pennington, NJ. Electrochemical Society