1.

Conference Proceedings
Conference Proceedings
1. 34 Rapid thermal annealing of atomic layer deposited hafnium-silicate/poly-silicon layers
Rittersma, Z.M. ; Massoubre, D. ; Roozeboorn, F. ; Verheijen, M.A. ; van Berkum, J.G.M ; Tamminga, Y. ; Dao, F. ; Snijders, J.H.M ; Vainonen-Ahigren, E. ; Fois, F. ; Tuominen, M. ; Haukka, S.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.273-280,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-14
2.

Conference Proceedings
Conference Proceedings
2. 28 Self-aligned PtSi Fully Silicided (FUST) Metal Gates for 45 nm CMOS Applications
van Dal, M.J.H. ; Lauwers, A. ; Cunniffe, J. ; Verbeeck, R. ; Vrancken, C. ; Demeurisse, C. ; Dao, T. ; Tamminga, Y. ; Veloso, A. ; Kittl, J.A. ; Maex, K.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.233-240,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
3.

Conference Proceedings
Conference Proceedings
3. 26 Tantalum-based Gate Electrode Metals for Advanced CMOS Devices
Hooker, J. C. ; Lander, R.J.P. ; Cubaynes, F. N. ; Schram, T. ; Roozeboom, F. ; van Zijl, J. ; Moos, M. ; van den Heuvel, F.C. ; Naburgh, E. ; van Berkum, J. G. M. ; Tamminga, Y. ; Dao, T. ; Henson, K. ; Schaekers, M. ; van Ammel, A. ; Tokei, Z. ; Demand, M. ; Dachs, C. (Invited Paper)
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.215-224,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
4.

Conference Proceedings
Conference Proceedings
4. Dopant Diffusion in Amorphous Silicon
Duffy, R. ; Venezia, V.C. ; Heringa, A. ; Hopstaken, M.J.P. ; Maas, G.C.J. ; Dao, T. ; Tamminga, Y. ; Roozeboom, F.
Pub. info.: Silicon front-end junction formation : physics and technology : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.437-442,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 810
5.

Conference Proceedings
Conference Proceedings
5. Control Of A Metal-Electrode Work-Function By Solid-State Diffusion Of Nitrogen
Lander, R.J.P. ; Hooker, J.C. ; Zijl, J.P. van ; Roozeboom, F. ; Maas, M.P.M. ; Tamminga, Y. ; Wolters, R.A.M.
Pub. info.: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.253-260,  2002.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 716
6.

Conference Proceedings
Conference Proceedings
6. Radiation-induced carbon contamination of optics
Kurt, R. ; van Beek, M. ; Crombeen, C. ; Zalm, P. ; Tamminga, Y.
Pub. info.: Emerging Lithographic Technologies VI.  Part Two  pp.702-709,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688