1.

Conference Proceedings
Conference Proceedings
1. Development of focused ion-beam repair for opaque defects on MoSi-based attenuated phase-shift mask
Nishida, N. ; Nishio, Y. ; Kinoshita, H. ; Takaoka, O. ; Kozakai, T. ; Aita, K.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.599-608,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
2.

Conference Proceedings
Conference Proceedings
2. Advanced FIB mask repair technology for 100-nm/ArF lithography: II
Hagiwara, R. ; Yasaka, A. ; Aita, K. ; Takaoka, O. ; Koyama, Y. ; Kozakai, T. ; Doi, T. ; Muramatsu, M. ; Suzuki, K. ; Sugiyama, Y. ; Matsuda, O. ; Okabe, M. ; Shinohara, S. ; Hasuda, M. ; Adachi, T. ; Morikawa, Y. ; Nishiguchi, M. ; Sato, Y. ; Hayashi, N. ; Ozawa, T. ; Tanaka, Y. ; Yoshioka, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.510-519,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Advanced photomask repair technology for 65-nm lithography: II
Itou, Y. ; Tanaka, Y. ; Yoshioka, N. ; Sugiyama, Y. ; Hagiwara, R. ; Takahashi, H. ; Takaoka, O. ; Kozakai, T. ; Matsuda, O. ; Suzuki, K. ; Okabe, M. ; Kikuchi, S. ; Uemoto, A. ; Yasaka, A. ; Adachi, T. ; Nishida, N. ; Ozawa, T.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1132-1143,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
4.

Conference Proceedings
Conference Proceedings
4. Advanced photomask repair technology for 65 nm lithography (4) [5992-170]
Itou, Y. ; Tanaka, Y. ; Suga, O. ; Sugiyama, Y. ; Hagiwara, R. ; Takahashi, H. ; Takaoka, O. ; Kozakai, T. ; Matsuda, O. ; Suzuki, K. ; Okabe, M. ; Kikuchi, S. ; Uemoto, A. ; Yasaka, A. ; Adachi, T.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59924Y-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
5.

Conference Proceedings
Conference Proceedings
5. Advanced FIB mask repair technology for 100-nm/ArF lithography
Hagiwara, R. ; Yasaka, A. ; Aita, K. ; Takaoka, O. ; Koyama, Y. ; Kozakai, T. ; Doi, T. ; Muramatsu, M. ; Suzuki, K. ; Sugiyama, Y. ; Sawaragi, H. ; Okabe, M. ; Shinohara, S. ; Hasuda, M. ; Adachi, T. ; Morikawa, Y. ; Nishiguchi, M. ; Sato, Y. ; Hayashi, N. ; Ozawa, T. ; Tanaka, Y. ; Yoshioka, N.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1056-1064,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
6.

Conference Proceedings
Conference Proceedings
6. Advanced FIB mask repair technology for 90-nm/ArF lithography: III
Tanaka, Y. ; Itou, Y. ; Yoshioka, N. ; Hagiwara, R. ; Yasaka, A. ; Takaoka, O. ; Kozakai, T. ; Koyama, Y. ; Sawaragi, H. ; Sugiyama, Y. ; Muramatsu, M. ; Doi, T. ; Suzuki, K. ; Okabe, M. ; Shinohara, M. ; Matsuda, O. ; Aita, K. ; Adachi, T. ; Morikawa, Y. ; Nishiguchi, M. ; Satoh, Y. ; Hayashi, N.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.526-537,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
7.

Conference Proceedings
Conference Proceedings
7. Advanced photomask repair technology for 65-nm lithography (1)
Itou, Y. ; Tanaka, Y. ; Yoshioka, N. ; Sugiyama, Y. ; Hagiwara, R. ; Takahashi, H. ; Takaoka, O. ; Tashiro, J. ; Suzuki, K. ; Okabe, M. ; Kikuchi, S. ; Uemoto, A. ; Yasaka, A. ; Adachi, T. ; Nishida, N. ; Ozawa, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.301-312,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
8.

Conference Proceedings
Conference Proceedings
8. FIB mask repair technology for electron projection lithography
Yamamoto, Y. ; Hasuda, M. ; Suzuki, H. ; Sato, M. ; Takaoka, O. ; Matsumura, H. ; Matsumoto, N. ; Iwasaki, K. ; Hagiwara, R. ; Suzuki, K. ; Ikku, Y. ; Aita, K. ; Kaito, T. ; Adachi, T. ; Yasaka, A. ; Yamamoto, J. ; Iwasaki, T. ; Yamabe, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.348-356,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
9.

Conference Proceedings
Conference Proceedings
9. Advanced photomask repair technology for 65nm lithography (3) [5853-89]
Itou, Y. ; Tanaka, Y. ; Sugiyama, Y. ; Hagiwara, R. ; Takahashi, H. ; Takaoka, O. ; Kozakai, T. ; Matsuda, O. ; Suzuki, K. ; Okabe, M. ; Kikuchi, S. ; Uemoto, A. ; Yasaka, A. ; Adachi, T. ; Nishida, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.1000-1008,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853