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36 results

Conference Proceedings

1. Kinetic Study on PMMA-CO2 System by Raman Spectroscopy (523)

Takahashi,M. ; Yamamoto,Y. ; Handa,Y.P. ; Nawaby,V.

Pub. info.:	ANTEC 2002, annual technical conference, San Francisco, CA, May 5-9, 2002. 3 pp.3737-3741, 2002. Brookfield, Conn.. Society of Plastic Engineers.
Title of ser.:	Annual Technical Conference - ANTEC : Society of Plastics Engineers Annual Technical Papers
Ser. no.:	60

Conference Proceedings

2. Effect of the dissolution contrast on the process margin in 193-nm lithography

Takahashi,M. ; Kishimura,S. ; Naito,T. ; Ohfuji,T. ; Sasago,M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.195-204, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

3. Conformational flexibility of domain III of annexin V:the effect of pH and binding to membrane-water interfaces

Sopkova,J. ; Vincent,M. ; Takahashi,M. ; Lewit-Bentley,A. ; Gallay,J.

Pub. info.:	Proceedings of advances in fluorescence sensing technology IV : 24-27 January 1999, San Jose, California. pp.111-123, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3602

Conference Proceedings

4. Negative-type chemically amplified resists for ArF excimer laser lithography

Naito,T. ; Takahashi,M. ; Ohfuji,T. ; Sasago,M.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.503-511, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

5. Correlation between power density fluctuation and grain size distribution of laser-annealed polycrystalline silicon

Suzuki,K. ; Saitou,M. ; Takahashi,M. ; Hayashi,N. ; Terabayashi,T.

Pub. info.:	Laser applications in microelectronic and optoelectronic manufacturing IV : 25-27 January 1999, San Jose, California. pp.310-319, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3618

Conference Proceedings

6. Acid amplification of chemically amplified resists for 193-nm lithography

Ohfuji,T. ; Takahashi,M. ; Kuhara,K. ; Ogawa,T. ; Ohtsuka,H. ; Sasago,M. ; Ichimura,K.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.76-82, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

7. Optical transition properties of rare-earth ions in nonfluoride halide glasses

Shojiya,M. ; Kadono,K. ; Takahashi,M. ; Kanno,R. ; Kawamoto,Y.

Pub. info.:	Rare-earth-doped devices II : 26-27 January 1998, San Jose, California. pp.23-30, 1998. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3280

Conference Proceedings

8. Damage control during dry etching of EUV mask:I. Control of surface roughness

Hoshino,E. ; Ogawa,T. ; Takahashi,M. ; Hoko,H. ; Yamanashi,H. ; Hirano,N. ; Okazaki,S.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.786-791, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

9. Development of a new color conversion system

Sugiura,H. ; Kagawa,S. ; Takahashi,M. ; Matoba,N.

Pub. info.:	Color imaging : device-independent color, color hardcopy, and graphic arts VI : 23-26 January 2001, San Jose, [California] USA. pp.278-289, 2001. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4300

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Conference Proceedings

10. Removal process for buffer layer on multilayer of EUVL mask

Hoshino,E. ; Ogawa,T. ; Takahashi,M. ; Hoko,H. ; Yamanashi,H. ; Hirano,N. ; Chiba,A. ; Lee,B.-T. ; Ito,M. ; Okazaki,S.

Pub. info.:	17th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.13-17, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4349

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Author: Takahashi,M.