1.

Conference Proceedings
Conference Proceedings
1. A Large Area Multi-Frequency Multi-Planar Coil Inductively Plas- ma Source
Yamada, N. ; Ventzek, P.L.G. ; Date, H. ; Sakai, Y. ; Tagashira, H.
Pub. info.: Proceedings of the eleventh International Symposium on Plasma Processing.  pp.126-136,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-12
2.

Conference Proceedings
Conference Proceedings
2. RF Atmospheric Pressure Glow Discharges for Naterial Processing
Miyashita, T. ; Sakai, K. ; Ventzak, P.L.G. ; Sakai, Y. ; Tagashira, H.
Pub. info.: Proceedings of the eleventh International Symposium on Plasma Processing.  pp.137-147,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-12
3.

Conference Proceedings
Conference Proceedings
3. Simulation of Plasma Etch Process Control on Etching Time-Scales: Multi-Coil Control of an Inductively Coupled Plasma Source
Yang, J. ; Yamada, N. ; Ventzek, P.L.G. ; Sakai, Y. ; Date, H. ; Tagashira, H. ; Kitamori, K.
Pub. info.: Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing.  pp.233-244,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-9
4.

Conference Proceedings
Conference Proceedings
4. Simulations of Real-Time Two-coil Control of an Inductively Coupled Plasma for Etching Applications
Yamada, N. ; Ventzek, P.L.G. ; Sakai, Y. ; Tagashira, H.
Pub. info.: Proceedings of the Symposium on Process control, Diagnostics, and Modeling in Semiconductor Manufacturing.  pp.575-587,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-2