1.

Conference Proceedings
Conference Proceedings
1. CLEANING OF SiO2 BULK LAYERS WITH SUCCESSIVE PROCESSING OF POLY-Si CVD AND UV/Cl2
Sugino, R. ; Tada, Y. ; Ito, T. ; Okui, Y. ; Sakuma, J.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.328-335,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
2.

Conference Proceedings
Conference Proceedings
2. Nitrogen Profile Engineering for Tunnel Oxynitrides
Sugizaki, T. ; Tada, Y. ; Hikazutani, K-I. ; Nakanishi, T. ; Takasaki, K.
Pub. info.: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.207-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 567
3.

Conference Proceedings
Conference Proceedings
3. Physiological monitoring of team and task stressors
Orasanu, J. ; Tada, Y. ; Kraft, N.
Pub. info.: Biomonitoring for physiological and cognitive performance during military operations : 31 March-1 April 2005, Orlando, Florida, USA.  pp.182-192,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5797
4.

Technical Paper
Technical Paper
4. Development of the Next-Generation Steering System (Development of the Twin Lever Steering for Production Vehicle).
Tajima, T. ; Tada, Y. ; Nakamura, Y. ; Tamura, N.
Pub. info.: 2011 SAE world congress : technical paper.  2011.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2011
5.

Conference Proceedings
Conference Proceedings
5. Advanced electron-beam writing system EX-11 for next-generation mask fabrication
Tojo, T. ; Yoshikawa, R. ; Ogawa, Y. ; Tamamushi, S. ; Hattori, Y. ; Koikari, S. ; Kusakabe, H. ; Abe, T. ; Ogasawara, M. ; Akeno, K. ; Anze, H. ; Hattori, K. ; Hirano, R. ; Yoshitake, S. ; Iijima, T. ; Ohtoshi, K. ; Matsuki, K. ; Shimomura, N. ; Yamada, N. ; Higurashi, H. ; Nakayamada, N. ; Fukudome, Y. ; Hara, S. ; Murakami, E. ; Kamikubo, T. ; Suzuki, Y. ; Oogi, S. ; Shimizu, M. ; Nishimura, S. ; Tsurumaki, H. ; Yasuda, S. ; Ooki, K. ; Koyama, K. ; Watanabe, S. ; Yano, M. ; Suzuki, H. ; Hoshino, H. ; Toriumi, M. ; Watanabe, O. ; Tsuji, K. ; Katayama, M. ; Tsuchiya, S. ; Suzuki, K. ; Kurasawa, S. ; Okuzono, K. ; Yamada, H. ; Handa, K. ; Suzuki, Y. ; Akiyama, T. ; Tada, Y. ; Noma, A. ; Takigawa, T.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.416-425,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748