1.

Conference Proceedings
Conference Proceedings
1. CD metrology of binary and phase shift masks using scatterometry [5992-55]
Lee, K. M. ; Yedur, S. ; Tabet, M. ; Tavassoli, M.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921I-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
2.

Conference Proceedings
Conference Proceedings
2. Scatterometry based CD and profile metrology of MoSi/ quartz structures [5992-153]
Yedur, S. ; Vuong, V. ; Shivaprasad, D. ; Sarathy, T. P. ; Tabet, M. ; Korlahalli, R. ; Hu, J.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59924I-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
3.

Conference Proceedings
Conference Proceedings
3. Contact hole CD and profile metrology of binary and phase-shift masks: effect of modeling strategies in application of scafferometery [6349-22]
Lee, K. ; Yedur, S. ; Tavassoli, M. ; Baik, K. ; Tabet, M.
Pub. info.: Photomask Technology 2006.  pp.63490M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
4.

Conference Proceedings
Conference Proceedings
4. CD and profile metrology of EUV masks using scatterometry based optical digital profilometry [6349-92]
Cho, S. ; Yedur, S. ; Kwon, M. ; Tabet, M.
Pub. info.: Photomask Technology 2006.  pp.63492I-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349