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Conference Proceedings

1. Gamma-Ray Irradiation Response of the Motor-Driver Circuit with SiC MOSFETs

Y. Kobayashi ; T. Yokozeki ; T. Matsuda ; S. Mitomo ; K. Murata

Pub. info.:	Silicon Carbide and Related Materials 2015 : [ICSCRM 2015] : selected, peer reviewed papers from the 16th International Conference on Silicon Carbide and Related Materials, October 4-9, 2015, Giardini Naxos, Italy. pp.868-871, 2016. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	858

Conference Proceedings

2. Change in Characteristics of SiC MOSFETs by Gamma-Ray Irradiation at High Temperature

T. Matsuda ; T. Yokoseki ; S. Mitomo ; K. Murata ; T. Makino

Pub. info.:	Silicon Carbide and Related Materials 2015 : [ICSCRM 2015] : selected, peer reviewed papers from the 16th International Conference on Silicon Carbide and Related Materials, October 4-9, 2015, Giardini Naxos, Italy. pp.860-863, 2016. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	858

Conference Proceedings

3. Non-Destructive Testing of Hardened Carbon Steel Using Frequency Sweeping Excitation and Spectrogram Method

T. Matsuda ; Y. Tsuchida ; M. Enokizono

Pub. info.:	Applied electromagnetic engineering for magnetic, superconducting and nano materials : selected peer reviewed papers from the seventh Japanese-Mediterranean and Central European workshop on applied electromagnetic engineering for magnetic, superconducting and nano materials (JAPMED'7) July 6-9 2011, Budapest, Hungary. pp.231-236, 2012. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	721

Conference Proceedings

4. Effect of Deposition Temperature on Chemical Structure of Lanthanum Oxide/Si Interface Structure

H. Nohira ; T. Matsuda ; K. Tachi ; Y. Shiino ; J. Song ; Y. Kuroki ; J. Ng ; P. Ahmet ; K. Kakushima ; K. Tsutsui ; E. Ikenaga ; K. Kobayashi ; H. Iwai ; T. Hattori

Pub. info.:	Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment. pp.169-174, 2006. Pennington, NJ. Electrochemical Society
Title of ser.:	ECS transactions
Ser. no.:	3(2)

Conference Proceedings

5. Repairing x-ray masks with Ta absorbers using focused ion beams

I. Okada ; Y. Saitoh ; T. Ohkubo ; M. Sekimoto ; T. Matsuda

Pub. info.:	Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan. pp.172-179, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2512

Conference Proceedings

6. New spatial frequency doubling method for sub-0.15-µm optical lithography

A. Otaka ; Y. Kawai ; A. Tanaka ; T. Matsuda

Pub. info.:	Optical/laser microlithography VIII : 22-24 February, 1995, Santa Clara, California. pp.816-826, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2440

Conference Proceedings

7. Approach to fabricating defect-free x-ray masks

I. Okada ; T. Ohkubo ; Y. Saitoh ; M. Sekimoto ; T. Matsuda

Pub. info.:	Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California. pp.253-263, 1995. Bellingham, WA. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2437

Conference Proceedings

8. Alternative process schemes for double patterning that eliminate the intermediate etch step

M. Maenhoudt ; R. Gronheid ; N. Stepanenko ; T. Matsuda ; D. Vangoidsenhoven

Pub. info.:	Optical Microlithography XXI. 1 pp.69240P-1-69240P-12, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6924

Conference Proceedings

9. A methodology for double patterning compliant split and design

V. Wiaux ; S. Verhaegen ; F. Iwamoto ; M. Maenhoudt ; T. Matsuda

Pub. info.:	Lithography Asia 2008. 1 pp.71401X-1-71401X-14, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7140

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Conference Proceedings

10. Lorentz microscopy and electron holography studies of current-excited magnetization dynamics in Permalloy nanowires

Y. Togawa ; T. Kimura ; K. Harada ; T. Akashi ; T. Matsuda

Pub. info.:	Spintronics : 10-14 August 2008, San Diego, California, USA. pp.703617-1-703617-12, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7036

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Author: T. Matsuda