1.
Conference Proceedings
S. Lee ; C. Lee ; T. Jeong ; H. Kim
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS 4 : new materials, processes and equipment . pp.367-374, 2008. Pennington, N.J.. Electrochemical Society
Title of ser.:
ECS transactions
Ser. no.:
13(1)
2.
Conference Proceedings
T. Kim ; S. Choi ; T. Jeong ; S. Kang ; K. Shim
Pub. info.:
SiGe, Ge, and Related Compounds 3: Materials, Processing, and Devices . pp.127-133, 2008. Pennington, NJ. Electrochemical Society
Title of ser.:
ECS transactions
Ser. no.:
16(10)
3.
Conference Proceedings
T. Kim ; S. Choi ; T. Jeong ; S. Kang ; K. Shim
Pub. info.:
SiGe, Ge, and Related Compounds 3: Materials, Processing, and Devices . pp.875-880, 2008. Pennington, NJ. Electrochemical Society
Title of ser.:
ECS transactions
Ser. no.:
16(10)